This is a video based on my substack article: https://frederickchen.substack.com/p/resist-loss-model-for-the-euv-stochastic, also republished on Pulse (LinkedIn): https://www.linkedin.com/pulse/resist-loss-model-euv-stochastic-defectivity-cliffs-frederick-chen-9bv3c/ Resist loss from the EUV-induced plasma is a new consideration in the analysis of stochastic defects in EUV lithography.
AI assisted in the narration and production of this presentation.
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Richard Platt
onto Internet of Things - Technology focus June 7, 2025 9:33 PM
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More goodness from Frederick Chen, the God Level Engineer of EUV. This is a video based on his Substack article: https://frederickchen.substack.com/p/resist-loss-model-for-the-euv-stochastic, also republished on Pulse (LinkedIn): https://www.linkedin.com/pulse/resist-loss-model-euv-stochastic-defectivity-cliffs-frederick-chen-9bv3c/. Resist losses from the EUV-induced plasma is a new consideration in the analysis of stochastic defects in EUV lithography. -- AI assisted in the narration and production of this presentation.